Weakly Magnetized Technological Plasmas
One key technical plasma application is the modification of surfaces by dry etching, thin film deposition, and/or surface functionalization. New promising discharge configurations were designed e.g. magnetized plasmas utilizing inhomogeneous field structures (cusps, neutral loop), multi frequency plasmas, and discharges operating with tailored voltage forms. One goal of the research is to enable the independent control of electron density and ion energy.