Research Department Plasmas with Complex Interactions

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Chemistry

PROF. DR. OLA NILSEN

In the context of the "Inorganic Chemistry Colloquium" Prof. Dr. Ola Nilsen from the Dept. of Chemistry of the University of Oslo Norway will talk about "Constructing complex oxides by ALD" on May 8, 2013 starting at 9:00 am (Core Lecture Hall NC 3/99).


Abstrac: The atomic layer deposition (ALD) technique can be used to construct thin films of numerous different types of binary oxides with surprisingly good quality. These oxides grow through self-limiting chemical reactions between the vapour phase and the available surfaces. When such binary processes are combined, several new effects may occur which may enhance or retard the processes since the surface chemistry is altered. The current talk will elaborate on experiences in deposition of multicomponent materials and show that what one first may believe is an obstacle, might be to your advantage.

Prof. Dr. Ola Nilsen