Faculty of Electrical Engineering and Information technology

PD DR. JULIAN SCHULZE, CHAIR OF ELECTRICAL ENGINEERING AND PLASMA TECH-NOLOGY

Dr. Schulze studies high frequency technological low temperature plasmas at low and high pressure, e.g. capaci-tively and inductively coupled discharges, based on experiments, simulations, and models. The primary research goal is to obtain fundamental insights into the plasma physics and chemistry to perform knowledge based plasma process development for e.g. plasma etching, sputtering, and deposition. Current externally funded projects range from electron heating in capacitive discharges, control of electron and ion energy distributions by Voltage Wave-form Tailoring, the Electrical Asymmetry Effect, plasma based control of radio frequency magnetron sputtering, multi-frequency sputter deposition of ceramics to dielectric plasma etching, streamer dynamics in dielectric barri-er discharges, and experimental validation of plasma simulations. These research activities are embedded in an international collaboration network including various academic institutions and companies.

Keywords: Technological High Frequency Plasmas, Plasma Surface Interactions, Plasma Diagnostics, Plasma Simula-tion, Knowledge based plasma process development

Webpage: Chair of Electrical Engineeringd and Plasma Technology